Surface characteristic analysis apparatus

Measuring and testing – Surface and cutting edge testing – Roughness

Reexamination Certificate

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Reexamination Certificate

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07337656

ABSTRACT:
In order to establish processing techniques capable of making multi-tip probes with sub-micron intervals and provide such microscopic multi-tip probes, there is provided an outermost surface analysis apparatus for semiconductor devices etc. provided with a function for enabling positioning to be performed in such a manner that there is no influence on measurement in electrical measurements at an extremely small region using this microscopic multi-tip probe, and there are provided the steps of making a cantilever1formed with a plurality of electrodes3using lithographic techniques, and forming microscopic electrodes6minute in pitch by sputtering or gas-assisted etching a distal end of the cantilever1using a focused charged particle beam or using CVD.

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patent: 6328902 (2001-12-01), Hantschel et al.
patent: 6465782 (2002-10-01), Kendall
patent: 6884999 (2005-04-01), Yedur et al.
patent: 2001-255257 (2001-09-01), None

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