Suppression of the formation of noxious substances during...

Details Suppression of the formation of noxious substances during... Suppression of the formation of noxious substances during...

2006-12-26

2006-12-26

Vanoy, Timothy C. (Department: 1754)

Chemistry of inorganic compounds

Oxygen or compound thereof

Metal containing

C423S077000, C423S079000, C423S215500

Reexamination Certificate

active

07153488

ABSTRACT:
The present invention is directed to the suppression of the formation noxious compounds such as furans. According to the present invention, a venturi device is used to rapidly quench a chlorinator reaction gas. The rapid quench minimizes the resonance time that furan precursors are at conditions conducive to furan formation.

REFERENCES:
patent: 3595395 (1971-07-01), Lorenzen
patent: 4066424 (1978-01-01), Kilgren et al.
patent: 4234446 (1980-11-01), Ramras
patent: 4247531 (1981-01-01), Hicks
patent: 5431346 (1995-07-01), Sinaisky
patent: 5679131 (1997-10-01), Obushenko
patent: 6080281 (2000-06-01), Attia
patent: 6315870 (2001-11-01), Tabatabaie-Raissi et al.
patent: 6328938 (2001-12-01), Taylor et al.
patent: 6334936 (2002-01-01), Tabatabaie-Raissi et al.
patent: 6426312 (2002-07-01), Lush
patent: 6585863 (2003-07-01), Davydov et al.
patent: 6616815 (2003-09-01), Kato et al.
patent: 6772595 (2004-08-01), Martling et al.
patent: 6811721 (2004-11-01), Taylor et al.
patent: 41 09 991 (1992-06-01), None
patent: 0 063 555 (1982-04-01), None
patent: 0 258 756 (1987-08-01), None
patent: WO 87/00157 (1987-01-01), None
patent: WO 92/17245 (1992-10-01), None
PCT International Search Report and PCT Written Opinion of International Searching Authority (Apr. 20, 2006).

Affiliated with

Also associated with

Rating

Suppression of the formation of noxious substances during... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Suppression of the formation of noxious substances during..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Suppression of the formation of noxious substances during... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3670733