Active solid-state devices (e.g. – transistors – solid-state diode – Specified wide band gap semiconductor material other than...
Reexamination Certificate
2005-09-27
2005-09-27
Wilson, Christian (Department: 2891)
Active solid-state devices (e.g., transistors, solid-state diode
Specified wide band gap semiconductor material other than...
C257S077000, C257S315000, C257S316000
Reexamination Certificate
active
06949769
ABSTRACT:
A MOSFET has greatly reduced leakage current between the gate electrode and the channel, source and drain regions. The gate electrode materials have lower electron affinities than the channel, source and drain regions. Gate electrode materials with negative electron affinities can also be used. The use of these gate electrode materials enables the band structures of the gate electrode and the other regions to be aligned in a manner that eliminates tunneling states for carriers tunneling between the gate and the body of the device.
REFERENCES:
patent: 4717685 (1988-01-01), Nakajima
patent: 4753895 (1988-06-01), Mayer et al.
patent: RE33584 (1991-05-01), Mimura
patent: 5406094 (1995-04-01), Arimoto et al.
patent: 5430310 (1995-07-01), Shibasaki et al.
patent: 5510279 (1996-04-01), Chien et al.
patent: 5670790 (1997-09-01), Katoh et al.
patent: 5886368 (1999-03-01), Forbes et al.
patent: 6031263 (2000-02-01), Forbes et al.
patent: 6066880 (2000-05-01), Kusunoki
patent: 6133603 (2000-10-01), Nomoto
patent: 6146926 (2000-11-01), Bhatnagar et al.
patent: 6261886 (2001-07-01), Houston
patent: 6307775 (2001-10-01), Forbes et al.
patent: 6309907 (2001-10-01), Forbes et al.
patent: 6492676 (2002-12-01), Kusunoki
patent: 6531751 (2003-03-01), Abusch-Magder et al.
patent: 6548825 (2003-04-01), Yoshii et al.
patent: 6586797 (2003-07-01), Forbes et al.
patent: 6599804 (2003-07-01), Bulucea et al.
Bermudez, V.M., et al., “AIN Films on GaN: Sources of Error in the Photoemission Measurement of Electron Affinity”, Journal of Applied Physics, vol. 89, No. 3, Feb. 1, 2001, p. 1991.
Buchanan, D.A., et al., 80 nm Poly-Silicon Gated n-FETs with Ultra-Thin Al2O3Gate Dielectric for ULSI Applications, IEDM Technical Digest, Washington D.C., Dec. 5-8, 1999, pp. 223-226.
Huang, Xuejue, et al., “Sub 50-nm FinFET: PMOS”, IEDM Technical Digest, Washington D.C., Dec. 5-8, 1999, pp. 67-70.
Lo, S.H., et al., “Quantum-Mechanical Modelling of Electron Tunneling Current from the Inversion Layer of Ultra-Thin-Oxide nMOSFET's”, IEEE Electron Device Letters, vol. 18, No. 5, May 1997, pp. 209-211.
Mimura, Hidenori, et al., “Enhancement in Electron Emission from Polycrystalline Silicon Field Emitter Arrays Coated with Diamondlike Carbon”, Journal of Applied Physics, vol. 84, No. 6, Sep. 15, 1998, pp. 3378-3381.
Ronning, C., et al., “Structural and Electronic Properties of Boron Nitride Thin Films Containing Silicon”, Journal of Applied Physics, vol. 84, No. 9, Nov. 1, 1998, pp. 5046-5051.
Weide, J. Van Der, et al., “Negative-Electron-Affinity Effects on the Diamond (100) Surface”, Physical Review B, vol. 50, No. 8, Aug. 15, 1994, pp. 5803-5806.
Wu, C.I., et al.; “GaN (0001)-(1×1) Surfaces: Composition and Electronic Properties”, Journal of Applied Phsyics, vol. 83, No. 8, Apr. 15, 1998, pp. 4249-4252.
Hu Chenming
Yeo Yee-Chia
Menz Doug
Wilson Christian
LandOfFree
Suppression of MOSFET gate leakage current does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Suppression of MOSFET gate leakage current, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Suppression of MOSFET gate leakage current will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3417576