Supported medium for electrophoresis and supports therefor

Details Supported medium for electrophoresis and supports therefor Supported medium for electrophoresis and supports therefor

1985-03-11

1987-02-03

Niebling, John F.

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

2041828, G01N 2728

Patent

active

046407596

ABSTRACT:
A process for electrophoresis employing a medium wherein the potential gradient along the direction of electrophoresis is made larger at both side portions of the medium than at the center portion thereof. A medium for employable for said process in that the length of the both side portions along the direction of electrophoresis is made shorter than that of the center portion is disclosed. Also disclosed is a support for the medium.

REFERENCES:
patent: 4194963 (1980-03-01), Denckla
patent: 4309268 (1982-01-01), Richman
patent: 4415418 (1983-11-01), Turre et al.
"Introducing Repliplate", FMC Catalog, .COPYRGT.1984.

Affiliated with

Also associated with

Rating

Supported medium for electrophoresis and supports therefor does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Supported medium for electrophoresis and supports therefor, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Supported medium for electrophoresis and supports therefor will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1090507