Superlattice avalance photodiode

Active solid-state devices (e.g. – transistors – solid-state diode – Responsive to non-electrical signal – Electromagnetic or particle radiation

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257186, H01L 31107, H01L 2974, H01L 31111

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active

055526292

ABSTRACT:
A semiconductor device according to the invention includes an electric field buffer layer, a superlattice multiplication layer and a cap layer, which are laminated. Around a mesa side surface, a round shape p.sup.+ dopant to a depth below the field buffer layer, and then the cap layer is etched so that the p.sup.+ region is not in contact with the cap layer. This creates a distance of several .mu.m in-between the inner surface of the p.sup.+ region and the external surface of the cap layer.

REFERENCES:
patent: 4840916 (1989-06-01), Yasuda et al.
patent: 5288989 (1994-02-01), Ishaque et al.
"Enhancement of Electron Impact Ionization in a Superlattice: A New Avalanche Photodiode with a Large Ionization Rate Ratio"; Capasso et al; American Institute of Physics; Appl. Phys. Letter, vol. 40, Jan. 1, 1982; pp. 38-40.
"InGaAsP-InAlAs Superlattice Avalanche Photodiode"; Kagawa et al; IEEE Journal of Quantum Electronics; vol. 28, Jun. 1992; pp. 1419-1423.
"Ati InGaAs/InAlAs Superlattice Avalance Photodiode with Thin Well Width for 10 Gb/s Optical Transmission Sysems"; Nakamurah et al; IOOC-ECOC '91. 17th European Conference on Optical Communication ECOC '91. 8th International Conference on Integrated Optics and Optical Fibre Communication IOOC '91, Paris, France, 9-12 Sep. 1991, Valbonne, France, See, France, pp. 261-264, vol. 1.
Tarof et al, "Planar InP/InGaAs Avalanche Photodetectors with Partial Charge Sheet in Device Periphery", Appl. Phys. Lett. 57(7), 13 Aug., 1990, pp. 670-672.
Nakamura et al, "An InGaAs/InAlAs Superlattice Avalanche Photodiode with Thin Well Width for 10Gb/s Optical Transmission Systems", ECOC, TuC5-4, 1991, pp. 261-264.

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