Superconductor films with improved flux pinning and reduced...

Superconductor technology: apparatus – material – process – Processes of producing or treating high temperature... – Producing lattice imperfection flux pinning sites or...

Reexamination Certificate

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C505S473000, C505S470000, C505S237000, C505S238000, C505S731000, C428S698000, C428S701000, C428S702000, C427S062000

Reexamination Certificate

active

07919435

ABSTRACT:
The present invention relates to a method for producing a defect-containing superconducting film, the method comprising (a) depositing a phase-separable layer epitaxially onto a biaxially-textured substrate, wherein the phase-separable layer includes at least two phase-separable components; (b) achieving nanoscale phase separation of the phase-separable layer such that a phase-separated layer including at least two phase-separated components is produced; and (c) depositing a superconducting film epitaxially onto said phase-separated components of the phase-separated layer such that nanoscale features of the phase-separated layer are propagated into the superconducting film.

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