Superconductor fabrication processes

Details Superconductor fabrication processes Superconductor fabrication processes

2008-03-04

2008-03-04

Padgett, Marianne (Department: 1762)

Coating processes

Measuring, testing, or indicating

C427S523000, C427S529000, C427S533000, C427S595000, C505S434000, C505S480000

Reexamination Certificate

active

07338683

ABSTRACT:
A method of forming a superconductive device is provided, including providing a substrate having a dimension ratio of not less than about 102, depositing a buffer film to overlie the substrate by ion beam assisted deposition utilizing and ion beam, monitoring spatial ion beam density of the ion beam over a target area, and depositing a superconductor layer to overlie the buffer film. Monitoring may be carried out by utilizing an ion detector having an acceptance angle of not less than 10°.

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