Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1990-12-24
1993-05-04
Nguyen, Nam
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
118620, 118727, 505 1, 20429809, 20429828, B05D 306, C23C 1400
Patent
active
052078841
ABSTRACT:
To deposit a plurality of substances on a substrate while the substrate remains in a low pressure oxygen environment, several target carriers are mounted around the edge of a disc and the disc is rotated to position the targets at the focal point of a fixed laser. The target carriers are themselves rotatable in bearings on the disc and are turned by a sun gear that is carried about the same shaft that turns the disc so that the heat of the laser beam is not concentrated at one spot on the surface of the target. All the apparatus is contained in a oxygen chamber. The substrate is heated and the targets are cooled continuously.
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Char Kook-rin
Newman Nathan
Rowell John M.
Conductus, Inc.
Jacobs Marvin E.
Nguyen Nam
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