Superconductive thin films having transition temperature substan

Details Superconductive thin films having transition temperature substan Superconductive thin films having transition temperature substan

1975-08-29

1977-08-23

Mack, John H.

Chemistry: electrical and wave energy

Processes and products

Vacuum arc discharge coating

75174, 335216, 427 62, C23C 1500, C22C 2702, H01F 722

Patent

active

040438880

ABSTRACT:
A sputtering technique is described in which a thin film superconductor is produced which exhibits a transition temperature in excess of the transition temperature of the bulk material. High gas pressures and low voltages are employed to produce Nb.sub.3 Ge exhibiting T.sub.c of 22.3.degree. K. The present invention was made in and during the course of work under DOD contract No. F 44-620-71-C-0045.

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patent: 3420763 (1969-01-01), Polito et al.
patent: 3506940 (1970-04-01), Corenzwit et al.
patent: 3533919 (1970-10-01), Prior
patent: 3549416 (1970-12-01), Rump et al.
patent: 3681226 (1972-08-01), Vogel
patent: 3691046 (1972-09-01), Okada et al.
patent: 3778260 (1973-12-01), Kawabe et al.
L. I. Maissel et al., "Handbook of Thin Film Technology", McGraw-Hill, N.Y., 1970, pp. 4-24, 4-25, 4-39.
R. W. Berry et al., "Thin Film Technology", Van Nostrand Reinhold, N.Y., 1968, p. 226.
J. J. Hanak et al., "Radio-Frequency Sputtered Films of B-Tungsten Structure Compounds", J. Appl. Phys., vol. 41, Nov. 1970, pp. 4958-4962.
J. R. Gavaler et al., "Sputtering Techniques for Controlling Composition of Thin Films of High Tc. Superconducting Compounds", J. Vac. Sci. Tech., vol. 8, pp. 180-183. 1971.

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