Superconducting multilayer interconnection formed of oxide super

Details Superconducting multilayer interconnection formed of oxide super Superconducting multilayer interconnection formed of oxide super

1995-06-30

1998-09-22

Kunemund, Robert

Superconductor technology: apparatus, material, process

Processes of producing or treating high temperature...

With material removal by etching, laser ablation, or...

505329, 505475, 117 94, 117106, 117947, H01L 3906

Patent

active

058113754

ABSTRACT:
A superconducting multilayer interconnection comprises a substrate having a principal surface, a first superconducting current path of a c-axis orientated oxide superconductor thin film formed on the principal surface of the substrate, an insulating layer on the first superconducting current path, and a second superconducting current path of a c-axis orientated oxide superconductor thin film formed on the insulating layer so that the first and second superconducting current paths are insulated by the insulating layer. The superconducting multilayer interconnection further comprises a superconducting interconnect current path of an a-axis orientated oxide superconductor thin film, through which the first and second superconducting current paths are electrically connected each other. In the superconducting multilayer interconnection, at least one of the first and second superconducting current paths has a step portion and the superconducting interconnect current path is positioned at the step portion so that the interface area between the superconducting current path and the superconducting interconnect current path is enlarged.

REFERENCES:
patent: 4980338 (1990-12-01), Yamazaki
patent: 5354734 (1994-10-01), Tanaka et al.
patent: 5366953 (1994-11-01), Chor et al.
patent: 5430012 (1995-07-01), Nakamura et al.
patent: 5567674 (1996-10-01), Inoda et al.

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