Superconducting microcircuitry by the microlithgraphic patternin

Details Superconducting microcircuitry by the microlithgraphic patternin Superconducting microcircuitry by the microlithgraphic patternin

1992-03-30

1993-08-24

Dang, Thi

Superconductor technology: apparatus, material, process

High temperature , per se

Having tc greater than or equal to 150 k

505725, 505728, 505742, 156655, 156656, 1566591, 156667, 20419234, H01L 3900

Patent

active

052389138

ABSTRACT:
Superconducting microcircuits including a thin layer of Ba.sub.2 Cu.sub.3 O.sub.5+x (0<x<1) on a substrate. A thin layer of a dopant; for example, Y.sub.2 O.sub.3 for superconducting patterns of YBa.sub.2 Cu.sub.3 O.sub.7-x, or Pr.sub.2 O.sub.3 for insulator patterns of PrBa.sub.2 Cu.sub.3 O.sub.7-x. These layers are covered with a layer of photoresist, which is exposed to light through a mask having a pattern for a desired circuit. The photoresist is then developed to reveal a pattern of the thin dopant layer which will be etched away. The microcircuit is then etched and stripped to remove the unneeded portion of the thin dopant layer. Finally, the microcircuit is heated at a temperature and for a period of time sufficient to diffuse and react the dopant layer with the thin layer of Ba.sub.2 Cu.sub.3 O.sub.5+x, forming a pattern of superconductor or insulator.

REFERENCES:
patent: 4892862 (1990-01-01), Ogushi et al.
patent: 4954480 (1990-09-01), Imanaka et al.
patent: 4960752 (1990-10-01), Ashok et al.
patent: 4971948 (1990-11-01), Dam et al.
patent: 4997809 (1991-03-01), Gupta
patent: 5017551 (1991-05-01), Agostinelli et al.

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