Superconducting device and a method for manufacturing the same

Active solid-state devices (e.g. – transistors – solid-state diode – Thin active physical layer which is – Tunneling through region of reduced conductivity

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257 35, 257 39, 505190, 505193, 505238, 427 62, 427 63, H01L 2906, H01B 1200, B05D 512

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active

055148778

ABSTRACT:
A superconducting device or a super-FET has a pair of superconducting electrode regions (20b,20c) consisting of a thin film (20)oxide superconductor being deposited on a substrate (5) and a weak link region (20a), the superconducting electrode regions (20b, 20c) being positioned at opposite sides of the weak link region (20a) these superconducting electrode regions (20b, 20c) and the weak link region (20a) being formed on a common plane surface of the substrate (5). The weak link region (20a) is produced by local diffusion of constituent element(s) of the substrate (5) into the thin film (20) of the oxide superconductor in such a manner that a substantial wall thickness of the thin film (20) of the oxide superconductor is reduced at the weak link region (20a) so as to leave a weak link or superconducting channel (10) in the thin film (20) of oxide superconductor over a non-superconducting region (50) which is produced by the diffusion.

REFERENCES:
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patent: 5026682 (1991-06-01), Clark et al.
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Rothschild et al, "Laser Patterning of Metal Oxide Superconductor Films by Reactive Solid-State Transformation", IEEE Electron Device Letters, vol. 9, #2, Feb. 1988, pp. 68-70.
Dijkkamp et al, "Preparation of Y-Ba-Cu-O Superconductor Thin Films Using Pulsed Laser Evaporation from Hi-Tc Bulk Material," App. Phys. Lett., vol. 51, #8, 24 Aug. 1987, pp. 619-621.
Clark et al, "Effects of Radiation Damage in Ion-Implanted Thin Films of Metal-Oxide Superconductors", Appl. Phys. Lett., vol. 51, #2, 13 Jul. 1987.
Yoshida et al, "Monolithic Device Fabrication Using High-Tc Superconductor", IEDM 88, pp. 282-285.

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