Superconducting ceramics by sequential electrodeposition of meta

Details Superconducting ceramics by sequential electrodeposition of meta Superconducting ceramics by sequential electrodeposition of meta

1990-08-06

1992-11-10

Niebling, John

Superconductor technology: apparatus, material, process

High temperature , per se

Having tc greater than or equal to 150 k

205 51, 205 91, 205 92, 205122, 205170, 205228, 205234, 505737, 505818, H01L 3924

Patent

active

051622955

ABSTRACT:
The invention provides a method for forming deposits of superconducting ceramics by sequentially electrodepositing layers of metals, of a type and in proportion suitable for forming a superconducting ceramic, to form a precursor metal deposit, followed by oxidizing the precursor deposit to form a superconducting ceramic deposit. Optionally, the electroplating steps are conducted in such a manner that a patterned precursor deposit results, to obtain a patterned superconducting deposit after oxidation.

REFERENCES:
patent: 2031185 (1936-02-01), Stephenson
patent: 2428033 (1947-09-01), Nachtman
patent: 2428318 (1947-09-01), Nachtman
patent: 2859158 (1958-11-01), Schaer
patent: 3506545 (1970-04-01), Garwin et al.
patent: 3524800 (1970-08-01), Morrice et al.
patent: 3616280 (1971-10-01), Arnold
patent: 4578157 (1986-03-01), Halliwell et al.
S. Jin et al., Appl. Phys. Lett., 52(19), pp. 1628-1630, 9 May 1988.
J. M. Rosamilia et al., J. Electrochem. Soc., vol. 136, No. 4, pp. 1053-1059, Apr. 1989.
F. A. Lowenheim, "Modern Electroplating", p. 463, (1974).
Gusmini et al., Commis. Energy At., Rapp. 1971 CEA-R4101.
Appl. Phys. Lett 52, 2077, (1988) A. Gupta et al., "Superconducting Oxide Films with High Transition Temperature . . . ".
Appl. Phys. Lett. 52, 2071, (1988), M. D. Kirk et al., "Scanning Tunneling Microscopy of the a-b Planes of Bi.sub.2 (Ca,Sr).sub.3 Cu.sub.2 O.sub.8+8 Single Crystal . . . ".
Appl. Phys. Lett. 52, 2068, (1988, A. Mogro-Campero et al., "Characterization of Thin Films of Y-Ba-Cu-O on Oxidized Silicon . . . ".
Appl. Phys. Lett. 52, 1992, (1988), B. T. Sullivan et al., "Bi-Sr-Ca-Cu-Oxide Superconducting Thin Films Deposited by dc Magnetron Sputtering".
Appl. Phys. Lett. 52, 1987, (1988), R. P. Gupta et al., "Y-Ba-Cu-O Superconducting Film on Oxidized Silicon".
Appl. Phys. Lett. 52, 1904, (1988), J. W. C. de Vries, "Preparation, Patterning, and Properties of Thin YBa.sub.2 Cu.sub.3 O.sub.7-8 Films".
J. Cryst. Growth, 85, 615 (1987), R. L. Henry et al., "Thin Film Growth of YBa.sub.2 Cu.sub.3 O.sub.x From Nitrate Solutions".
J. Cryst. Growth, 85, 619 (1987), A. S. Edelstein et al., "Formation of the Structure of the Superconducting Phase of La-Sr-Cu-O by dc Sputtering".
Appl. Phys. Lett. 51, 861 (1987), X. D. Wu et al., "Epitaxial Ordering of Oxide Superconductor Thin Films on (100) SrTiO.sub.3 Prepared by . . . ".
Appl. Phys. Lett. 52, 1834 (1988), D. M. Hwang et al., "Transmission Electron Microscopy Studies of Superconducting Y-Ba-Cu-O Films Prepared by . . . ".
Ext. Abstracts, Mat. Res. Soc., Reno, Nev., Apr. 5-9 (1988), D. W. Capone et al., "High Temperature Superconductors II".
App. Phys. Lett. 52, 1743 (1988), A. D. Berry et al., "Formation of High T.sub.c Superconducting Films by Organometallic Chemical Vapor Deposition".
Jap. J. Appl. Phys. 27, L1265 (1988), Nakamori et al., "Superconducting Y-Ba-Cu-O Oxide Films by OMCVD".
Jap. J. Appl. Phys. 27, L1275 (1988), Yamane et al., "T.sub.c of C-Axis-Oriented Y-Ba-Cu-O Films Prepared by CVD".
Appl. Phys. Lett. 53, 406 (1988), D. S. Ginley et al., "Sequential Electron Beam Evaporated Films of Tl.sub.2 CaBa.sub.2 Cu.sub.2 O.sub.y with Zero Resistance at 97 K".

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