Super-resolution by focal plane immersion

Details Super-resolution by focal plane immersion Super-resolution by focal plane immersion

1994-06-29

1999-06-15

Nguyen, Thong

Optical: systems and elements

Compound lens system

Microscope

359368, G02B 2106, G02B 2100

Patent

active

059127651

ABSTRACT:
Diffraction patterns in a focal region are governed by immersing the focal region in dielectric medium having an index of refraction higher than one. The pattern of the focal region is made small by causing the focal region to be immersed in a body having an index of refraction greater than 1. The resulting diffraction pattern sensed appropriately in the focal region is independent of traditional aperture limitations in resolving power. Microwave pictures are taken at the same resolution as optical pictures using the same aperture size when an appropriate dielectric immersion material is provided.

REFERENCES:
patent: 4119362 (1978-10-01), Holzman
patent: 4927254 (1990-05-01), Kino et al.
patent: 5004307 (1991-04-01), Kino et al.
patent: 5285318 (1994-02-01), Gleckman

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