Drug – bio-affecting and body treating compositions – Topical sun or radiation screening – or tanning preparations
Patent
1993-12-09
1996-01-30
Kulkosky, Peter F.
Drug, bio-affecting and body treating compositions
Topical sun or radiation screening, or tanning preparations
526328, 5263285, 5263295, 5263292, 526304, 526307, 5263077, A61K 3178, A61K 742
Patent
active
054878853
ABSTRACT:
Novel polymeric compositions and their intermediates are provided, providing for broad range protection from ultraviolet radiation. Acryl polymers comprising at least two different ultraviolet absorbing moieties having different light absorbing ranges are employed in conjunction with another hydrophilic monomer to provide sunscreen formulations for invisibility, and enhanced protection, without deleterious effects in the dermis.
REFERENCES:
patent: 3880875 (1975-04-01), Strobel et al.
patent: 4003990 (1977-01-01), Jacquet
patent: 4233430 (1980-11-01), Jacquet et al.
patent: 4508882 (1985-04-01), Yoshida et al.
patent: 4524061 (1985-06-01), Cho
patent: 5041282 (1991-08-01), Sabatelli
patent: 5063048 (1991-11-01), Saitoh
patent: 5099027 (1992-03-01), Vogl et al.
patent: 5134223 (1992-07-01), Langer
patent: 5204090 (1993-04-01), Han
patent: 5243021 (1993-09-01), Langer
patent: 5250652 (1993-10-01), Langer
patent: 5302376 (1994-04-01), Forestier et al.
Dromgoole, et al. (1990) Sunscreening agent intolerance, contact and photocontact sensitization and contact urticaria. J. Amer. Derm. 22:1068-1078.
Lowe (1990) Photoprotection. Sem Derm. 9:78-83.
Bakir Farid
Douglass, III James G.
Sovak Milos
Terry Ronald C.
Biophysica Inc.
Kulkosky Peter F.
Rowland Bertram I.
LandOfFree
Sunblocking polymers and their formulation does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Sunblocking polymers and their formulation, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Sunblocking polymers and their formulation will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-155727