Sulfur trioxide vapor phase stripping

Details Sulfur trioxide vapor phase stripping Sulfur trioxide vapor phase stripping

1987-09-10

1988-10-18

Garvin, Patrick P.

Cleaning and liquid contact with solids

Processes

With treating fluid motion

134 11, 134 41, 437229, B08B 308

Patent

active

047785365

ABSTRACT:
A method is set forth of treating the surface of an object such as a semiconductor wafer to remove impurities. In particular, the method serves to strip resist in a short period of time, of the order of 30 seconds. The object is positioned with the surface exposed within a treating chamber. Water vapor is contacted with sulfur trioxide vapor adjacent the surface to provide a hot mixture comprising sulfur trioxide, water and sulfuric acid. The hot mixture is impinged onto the surface. The contacting is immediately prior to and/or simultaneous with the impinging. Photoresist is quickly and efficiently removed in accordance with this process. Energy requirements are relatively low since the components are easily vaporized.

REFERENCES:
patent: 3727620 (1973-04-01), Orr
patent: 3769992 (1973-11-01), Wallestad
patent: 4253888 (1981-03-01), Kikuchi
patent: 4264374 (1981-04-01), Beyer et al.
patent: 4303454 (1981-12-01), Petterson et al.
patent: 4519846 (1985-05-01), Aigo
patent: 4695327 (1987-09-01), Grebinski

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