Chemistry of inorganic compounds – Modifying or removing component of normally gaseous mixture – Sulfur or sulfur containing component
Patent
1990-01-08
1990-12-11
Heller, Gregory A.
Chemistry of inorganic compounds
Modifying or removing component of normally gaseous mixture
Sulfur or sulfur containing component
423562, C01B 1700
Patent
active
049769375
ABSTRACT:
A method for removing sulfur dioxide from flue gases in a wet scrubbing system where calcium thiosulfate and calcium polysulfides are formed by the reaction of lime and emulsified sulfur and the mixture added to a recycle tank of the wet scrubber where it reacts with sulfites and bisulfites in the scrubbing slurry to produce thiosulfates from the calcium polysulfides, with the slurry then returned to the scrubber. The mixture of calcium thiosulfate and calcium polysulfides may be formed in the lime slaking tank or lime storage tank of a lime scrubbing system or formed in a mixing tank and added to a lime or limestone scrubbing system.
REFERENCES:
patent: 1336957 (1920-04-01), Hedenburg
patent: 3843771 (1974-10-01), Urban
patent: 3906080 (1975-09-01), Gorin et al.
patent: 3914378 (1975-10-01), Selmeczi
patent: 3919394 (1975-11-01), Selmeczi
patent: 4690805 (1987-09-01), Bhatia et al.
"Thiosulfate Additives for Lime/Limestone Scrubbing", Gary T. Rochelle, et al., Tenth Symposium on Flue Gas Desulfurization, Atlanta, Ga., Nov. 1986.
"Reducing Gypsum Scale in Wet FGD Systems Using Thiosulfate", David R. Owens, et al. POWER, May 1988.
Benson Lewis B.
College John W.
Lee Yungli J.
Dravo Lime Company
Heller Gregory A.
LandOfFree
Sulfur dioxide removal from flue gases with sulfite oxidation in does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Sulfur dioxide removal from flue gases with sulfite oxidation in, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Sulfur dioxide removal from flue gases with sulfite oxidation in will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-388822