Sulfur and/or amide-containing exposure accelerators for light-s

Details Sulfur and/or amide-containing exposure accelerators for light-s Sulfur and/or amide-containing exposure accelerators for light-s

1982-03-18

1984-05-01

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430145, 430157, 430177, 430178, 430179, 430180, 430181, 430182, 430292, 430294, 430300, 430302, G03C 158, G03C 160, G03C 154

Patent

active

044462182

ABSTRACT:
This invention relates to proof film-type light sensitive diazonium materials containing accelerators selected from sulfur and/or amide-containing compounds which are capable of accelerating the contact exposure of negative-working diazonium compounds when such diazonium compounds are subjected to UV radiation. These accelerators enhance essentially photosensitivity speed. The invention also relates to presensitized reproduction materials comprising diazonium materials containing these accelerators.

REFERENCES:
patent: 2063631 (1936-12-01), Schmidt et al.
patent: 2667415 (1954-01-01), Neugebauer et al.
patent: 2871119 (1959-01-01), Weegar et al.
patent: 2893866 (1959-07-01), Haefeli et al.
patent: 3312705 (1967-04-01), Sus et al.
patent: 3367776 (1968-02-01), Bialczak et al.
patent: 3623875 (1971-11-01), Desjarlais
patent: 3679419 (1972-07-01), Gillich
patent: 3785826 (1974-01-01), Slimowicz et al.
patent: 3849392 (1974-11-01), Steppan
patent: 3867147 (1975-02-01), Teuscher
patent: 3960684 (1976-06-01), Feinberg
Kosar, J., "Light-Sensitive Systems", J. Wiley & Sons, 1965, pp. 194, 220, 225, 231, 237 and 243.

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