Sulfonyldiazomethanes, photoacid generators, resist...

Details Sulfonyldiazomethanes, photoacid generators, resist... Sulfonyldiazomethanes, photoacid generators, resist...

2006-09-19

2006-09-19

Powers, Fiona T. (Department: 1626)

Organic compounds -- part of the class 532-570 series

Organic compounds

Diazo or diazonium

C534S564000, C430S170000, C430S270100, C430S326000

Reexamination Certificate

active

07109311

ABSTRACT:
A chemical amplification type resist composition comprising a specific benzenesulfonyldiazomethane containing a long-chain alkoxyl group at the 2-position on benzene ring has many advantages including improved resolution, improved focus latitude, minimized line width variation or shape degradation even on long-term PED, minimized debris left after coating, development and peeling, and improved pattern profile after development and is thus suited for microfabrication.

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