Sulfonyldiazomethanes, photoacid generators, resist...

Details Sulfonyldiazomethanes, photoacid generators, resist... Sulfonyldiazomethanes, photoacid generators, resist...

2006-09-05

2006-09-05

Chu, John S. (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

C430S270100, C430S326000, C430S905000, C534S558000

Reexamination Certificate

active

07101651

ABSTRACT:
A chemical amplification type resist composition comprising a specific sulfonyldiazomethane containing long-chain alkoxyl groups has many advantages including improved resolution, improved focus latitude, minimized line width variation or shape degradation even on long-term PED, minimized debris left after coating, development and peeling, and improved pattern profile after development and is thus suited for microfabrication.

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