Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Reexamination Certificate
2007-10-16
2007-10-16
Chu, John S. (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
C430S270100, C430S326000, C430S330000, C430S905000, C430S910000, C534S558000
Reexamination Certificate
active
10929059
ABSTRACT:
Provided are sulfonyldiazomethane compounds and photoacid generators suited for resist materials which generate less foreign matters after application, development and peeling, and in particular, are excellent in the pattern profile after the development; and resist materials and patterning process using them. Provided are sulfonyldiazomethane compounds represented by formula (1):Also provides are photoacid generators containing the sulfonyldiazomethane compounds, and a chemical amplification resist material comprising (A) a resin which changes its solubility in an alkali developer by action of an acid, and (B) a sulfonyldiazomethane compound of formula (1) capable of generating an acid by exposure to radiation. Provided is a patterning process comprising steps of applying the above-described resist material onto a substrate to form a coating, heating the coating, exposing the coating, and developing the exposed coating in a developer after an optional heat treatment.
REFERENCES:
patent: 2354229 (1944-07-01), Walter
patent: 5216135 (1993-06-01), Urano et al.
patent: 5945517 (1999-08-01), Nitta et al.
patent: 6004724 (1999-12-01), Yamato et al.
patent: 6261738 (2001-07-01), Asakura et al.
patent: 6338931 (2002-01-01), Maeda et al.
patent: 6395446 (2002-05-01), Seki et al.
patent: 3-103854 (1991-04-01), None
patent: 4-211258 (1992-08-01), None
patent: 8-123032 (1996-05-01), None
patent: 9-95479 (1997-04-01), None
patent: 9-208554 (1997-08-01), None
patent: 9-230588 (1997-09-01), None
patent: 9-301948 (1997-11-01), None
patent: 10-90884 (1998-04-01), None
patent: 11-38604 (1999-02-01), None
patent: 11-72921 (1999-03-01), None
patent: 2906999 (1999-04-01), None
patent: 11-190904 (1999-07-01), None
patent: 3024621 (2000-01-01), None
patent: 2000-314956 (2000-11-01), None
patent: 2000-344836 (2000-12-01), None
patent: 2001-55373 (2001-02-01), None
patent: 2001-106669 (2001-04-01), None
Paquette, “A Facile Conversion of Mercaptans to Homologous Terminal Olefins,”J. Am. Chem. Soc., vol. 86, pp. 4383-4385, Oct. 20, 1964.
Walter et al., “Thioether Barbiturates. I. Thiomethyl Derivatives,”J. Am. Chem. Soc., vol. 67, pp. 655-659, Apr. 1945.
Arimitsu et al., “Sensitivity Enhancement of Chemical-Amplification-Type Photoimaging Materials by Acetoacetic Acid Derivatives,”J. Photopolym. Sci. and Tech., vol. 8, No. 1, pp. 43-44, May 1995.
Arimitsu et al., “Effect of Phenolic Hydroxyl Residues on the Improvement of Acid-Proliferation-Type Photoimaging Materials,,”J. Photopolym. Sci. and Tech., vol. 9, No. 1, pp. 29-30, May. 1996.
Kudo et al., “Enhancement of the Senesitivity of Chemical-Amplification-Type Photoimaging Materials by B-Tosyloxyketone Acetals,”J. Photopolym. Sci. and Tech., vol. 8, No. 1, pp. 45-46, May 1995.
Fukuda Eiji
Kinsho Takeshi
Kobayashi Katsuhiro
Ohsawa Youichi
Tanaka Shigeo
Alston & Bird LLP
Chu John S.
LandOfFree
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