Sulfonyl compound and thermalsensitive recording medium using th

Details Sulfonyl compound and thermalsensitive recording medium using th Sulfonyl compound and thermalsensitive recording medium using th

1998-09-10

2000-03-21

Raymond, Richard L.

Organic compounds -- part of the class 532-570 series

Organic compounds

Sulfonate esters

549556, 558 57, 560108, 560221, 560255, 568 33, C07C30910, C07C31714

Patent

active

060404701

ABSTRACT:
There is provided a developer composition including at least one of sulfonyl compounds represented by formula (1) and at least one of sulfonyl compounds represented by formula 2: ##STR1## wherein X is H or lower alkyl, R.sub.1, R.sub.2, R.sub.3, R.sub.4, R.sub.5 and R.sub.6 which may be the same or different, present H, halogen or lower alkyl and Y represents alkyl, benzenesulfonyl, benzoyl et al, A thermalsensitive recording medium having the above developer is of high sensitivity, less surface-blushing with lapse of time and is excellent in storage stability of a recorded image, particularly in heat resistance, humidity resistance and anti-plasticizer.

REFERENCES:
patent: 3539375 (1970-11-01), Baum
Communication dated Sep. 4, 1997. European Search Report (and Annex) No. EP 97 10 2653.

Affiliated with

Also associated with

Rating

Sulfonyl compound and thermalsensitive recording medium using th does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Sulfonyl compound and thermalsensitive recording medium using th, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Sulfonyl compound and thermalsensitive recording medium using th will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-731714