Sulfonydiazomethanes, photoacid generators, resist...

Details Sulfonydiazomethanes, photoacid generators, resist... Sulfonydiazomethanes, photoacid generators, resist...

2006-06-06

2006-06-06

Chu, John S. (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

C430S270100, C430S326000, C430S905000, C534S558000

Reexamination Certificate

active

07056640

ABSTRACT:
Sulfonyldiazomethane compounds containing a long-chain alkyl- or alkoxy-naphthyl group are novel and useful as photoacid generators. Chemical amplification type resist compositions comprising the same are suited for microfabrication because of many advantages including improved resolution, improved focus latitude, and minimized line width variation or shape degradation even on long-term PED.

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