Sulfonium salts and chemically amplified positive resist composi

Details Sulfonium salts and chemically amplified positive resist composi Sulfonium salts and chemically amplified positive resist composi

1996-11-01

1998-10-20

Burn, Brian M.

Organic compounds -- part of the class 532-570 series

Organic compounds

Sulfur containing

4302701, C07C31900

Patent

active

058248242

ABSTRACT:
The invention provides a novel sulfonium salt having at least one acid labile group attached to a phenyl group in a molecule and a C.sub.2 -C.sub.20 alkylsulfonate or arylsulfonate anion whose alkyl or aryl has as a substituent an electron withdrawing group such as fluorine and nitro group. The novel sulfonium salt is effective for increasing the dissolution contrast between exposed and unexposed areas. Upon exposure, it generates a substituted alkyl or arylsulfonic acid which is a weak acid, minimizing the influence of side reaction and deactivation during PEB step. The sulfonium salt is useful in a chemically amplified positive resist composition which lends itself to fine patterning and features high resolution.

REFERENCES:
patent: 3929886 (1975-12-01), Isard et al.
patent: 5084371 (1992-01-01), Schwalm et al.
patent: 5569784 (1996-10-01), Watanabe et al.
patent: 5633409 (1997-05-01), Watanabe et al.

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