Sulfonium salts and chemically amplified positive resist composi

Details Sulfonium salts and chemically amplified positive resist composi Sulfonium salts and chemically amplified positive resist composi

1997-03-04

1998-12-08

Burn, Brian M.

Organic compounds -- part of the class 532-570 series

Organic compounds

Amino nitrogen containing

546266, 4302701, C07C21144

Patent

active

058472185

ABSTRACT:
The invention provides a novel sulfonium salt having a substituted or unsubstituted arylsulfonate anion. The novel sulfonium salt minimizes the influence of deactivation by basic compounds not only at a resist surface, but also at a resist-substrate interface, assists a resist to be configured to a definite pattern profile. When the sulfonium salt has an acid labile group, it is effective for increasing the dissolution contrast between exposed and unexposed areas. The sulfonium salt is useful in a chemically amplified positive resist composition which lends itself to fine patterning and features high resolution.

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patent: 5084371 (1992-01-01), Schwalm et al.
patent: 5191124 (1993-03-01), Schwalm et al.
patent: 5569784 (1996-10-01), Watanabe et al.

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