Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – From reactant having at least one -n=c=x group as well as...
Patent
1990-09-10
1993-01-05
Foelak, Morton
Synthetic resins or natural rubbers -- part of the class 520 ser
Synthetic resins
From reactant having at least one -n=c=x group as well as...
528 81, 528 85, 430281, 430287, 430288, C08G 1830, C08G 1842, C08G 1868
Patent
active
051771713
ABSTRACT:
A sulfonic acid group-containing polyurethane produced from a sulfonic acid group-containing polyamide diol and/or a sulfonic acid group containing polyester diol, a dihydroxyhydrocarbon having a specific molecular weight and a diisocyanate. This polyurethane has not only high hydrophilicity but also excellent mechanical strength, excellent heat resistance, low permanent tensile set and low hardness, which are required for the base polymer for a photosensitive resin composition to be used for producing a flexographic printing plate. Further, a photosensitive resin composition containing such a sulfonic acid group-containing polyurethane has excellent photosensitivity and in addition, has excellent properties such that after the photosensitive resin composition has been exposed to actinic rays through an image-bearing transparency, the development of the exposed composition can be performed with water or an aqueous alkali solution. From this photosensitive resin composition, a flexographic printing plate having excellent printing resistance, ink resistance and mechanical properties can be obtained.
REFERENCES:
patent: 4224418 (1980-09-01), Dieterich et al.
patent: 4394435 (1983-07-01), Farber et al.
patent: 5053316 (1990-10-01), Suzuki et al.
Nakano Katsuya
Oguri Takeshi
Usubuchi Yutaka
Asahi Kasei Kogyo Kabushiki Kaisha
Foelak Morton
Truong D.
LandOfFree
Sulfonic acid group-containing polyurethane and a photosensitive does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Sulfonic acid group-containing polyurethane and a photosensitive, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Sulfonic acid group-containing polyurethane and a photosensitive will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2391259