Subsystem of an illumination system of a microlithographic...

Details Subsystem of an illumination system of a microlithographic... Subsystem of an illumination system of a microlithographic...

2007-09-05

2011-10-11

Glick, Edward (Department: 2882)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S053000

Reexamination Certificate

active

08035803

ABSTRACT:
In general, in one aspect, the disclosure features an illumination system for a microlithographic projection exposure apparatus configured so that during operation the illumination system illuminates a reticle plane of the microlithographic projection exposure apparatus with light of a desired polarization distribution. The illumination system includes a first polarization-influencing optical element and a second polarization-influencing optical element. During operation the first polarization-influencing optical element converts a first polarization distribution produced by a light source unit into a second polarization distribution which is different from the first polarization distribution. The second polarization-influencing optical element converts the second polarization distribution into a third polarization distribution corresponding to the desired polarization distribution, the second polarization-influencing optical element causing an effective rotation of the preferred polarization direction through 90° over its optically effective surface.

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