Substrates for use in screen photosensitive element

Details Substrates for use in screen photosensitive element Substrates for use in screen photosensitive element

1978-05-09

1980-11-04

Martin, Jr., Roland E.

Radiation imagery chemistry: process, composition, or product th

Electric or magnetic imagery, e.g., xerography,...

Radiation-sensitive composition or product

427243, 427247, 428137, G03G 504

Patent

active

042321042

ABSTRACT:
The conductive substrate is formed so that the pore openings therein gradually expand in size from one side to the other side of the substrate. When the subtrate is operated with an insulating material from the side having the larger openings, the insulating material adheres to the inclined internal circumferential surface of the pores. When a conductive layer is formed by vacuum evaporation deposition on the insulating layer, there is no short-circuit formed between the conductive layer and the substrate due to the complete insulation of the substrate without diminishing the size of the pore openings. The ratio of the smaller width of the openings to the larger width and the ratio of the depth of the inclined portion of each micro-opening to the thickness of the substrate are respectively within the range of from 1/5 to 4/5.

REFERENCES:
patent: 3976484 (1976-08-01), Ando et al.
patent: 4092160 (1978-05-01), Jackson et al.
patent: 4099863 (1978-07-01), Nakatsubo et al.

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