Substrates for in particular microlithography

Details Substrates for in particular microlithography Substrates for in particular microlithography

2006-10-31

2006-10-31

Rosasco, S. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C428S428000

Reexamination Certificate

active

07129010

ABSTRACT:
The present invention relates to a substrate in particular of EUV microlithography, to the production of a substrate of this type and to the use of this substrate as a substrate for mirrors and/or masks or mask blanks in particular in EUV microlithography.

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H. Bach: “Low Expansion Glass Ceramics”, Schott Series on Glass and Glass Ceramics, Science, Technology and Application, Springer Verlag, Germany, 1995, pp. 1-223.

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