Substrate with transparent conductive oxide film, process...

Details Substrate with transparent conductive oxide film, process... Substrate with transparent conductive oxide film, process...

2007-02-20

2007-02-20

Wong, Edna (Department: 1753)

Stock material or miscellaneous articles

Web or sheet containing structurally defined element or...

Physical dimension specified

C136S255000, C136S256000, C428S334000, C428S336000, C428S432000, C428S689000, C428S702000, C428S699000, C257S458000, C257S431000, C252S518100, C252S519500, C252S520100, C252S519540

Reexamination Certificate

active

10826290

ABSTRACT:
A substrate with a transparent conductive oxide film (especially a substrate with a transparent conductive oxide film useful as a substrate for a thin-film silicon-based solar cell) being excellent in mass production efficiency and being characterized by having a low resistance, a high transparency and a good light scattering performance over a full wavelength region (300 nm to 3 μm) of solar ray, a process for its production, and a photoelectric conversion element (especially, solar cell) employing the substrate, are presented. A substrate with a transparent conductive oxide film, comprising a substrate and a transparent conductive oxide layer formed on the substrate and constituted by a plurality of ridges is and a plurality of flat portions, wherein the surfaces of the ridges and the flat portions, have many continuous micron-size protrusions.

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