Substrate with chemically modified surface and method of manufac

Details Substrate with chemically modified surface and method of manufac Substrate with chemically modified surface and method of manufac

1983-08-25

1984-06-05

Tung, T.

Chemistry: electrical and wave energy

Processes and products

Electrostatic field or electrical discharge

204165, 204168, 427 38, C07C 1700, B05D 306

Patent

active

044526792

ABSTRACT:
A method for providing specific chemical functional groups on a substrate surface is provided. In the method a vaporized material is introduced into a reaction zone to produce a plasma. Selective species of the plasma are prevented from contacting the substrate surface while the remaining species are contacted with the substrate.

REFERENCES:
patent: 3341352 (1967-09-01), Ehlers
patent: 3536602 (1967-01-01), Jones et al.
patent: 3591477 (1971-07-01), Pomerantz
patent: 3962057 (1976-06-01), Bartz
patent: 4317844 (1982-03-01), Carlson
patent: 4334844 (1982-06-01), Tanaka

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