Substrate with a flattening film, display substrate, and...

Liquid crystal cells – elements and systems – Particular structure – Having significant detail of cell structure only

Reexamination Certificate

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C349S143000

Reexamination Certificate

active

06894754

ABSTRACT:
The invention involves: the forming of a dummy pattern for planarization between convex portions (for example, between lead electrodes and a signal wire pattern) of irregularities caused by a patterned layer on a surface on which at least one interlayer insulating film is formed, so as to be separated by a predetermined distance from the convex portions; the forming of interlayer insulating films7a-7dso as to fill up gaps between the dummy pattern and the convex portions; and the planarizing of a surface. Thereby, the invention is capable of relaxing requirements on uniformity in the thickness of the film to be polished and the thickness of the polished portion.

REFERENCES:
patent: 5990988 (1999-11-01), Hanihara et al.
patent: 6261883 (2001-07-01), Koubuchi et al.
patent: 6441456 (2002-08-01), Konishi et al.
patent: 6734924 (2004-05-01), Hirakata et al.
patent: 2001-242443 (2001-09-01), None
patent: 436999 (2001-05-01), None
Taiwanese Office Action mailed Jun. 8, 2004, (w/English translation thereof).

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