Substrate washing method, substrate washing-drying method, subst

Details Substrate washing method, substrate washing-drying method, subst Substrate washing method, substrate washing-drying method, subst

1996-12-05

1999-12-14

Warden, Jill

Cleaning and liquid contact with solids

Processes

With work or work parts movable during treatment

134 2, 134 34, 134 61, 134902, B08B 300

Patent

active

060011912

ABSTRACT:
Disclosed is a method of washing substrates, comprising the steps of (a) introducing a washing solution into a processing vessel having a wafer boat movably mounted therein to fill the vessel with the washing solution, (b) allowing a plurality of wafers to be held collectively by chuck such that the wafers held by the chuck are arranged at substantially an equal pitch, (c) dipping the wafers together with the chuck in the washing solution within the processing vessel, (d) transferring the wafers from the chuck onto the wafer boat in an upper region of the processing vessel, (e) moving the wafers together with the wafer boat within the washing solution to allow the substrates to be positioned in a lower region of the processing vessel, (f) discharging the washing solution from the upper region of the processing vessel, (g) supplying a fresh washing solution into the lower region of the processing vessel so as to cause the washing solution within the processing vessel to overflow the processing vessel, (h) taking the washed wafers out of the processing vessel.

REFERENCES:
patent: 4643774 (1987-02-01), Kishida et al.
patent: 4778532 (1988-10-01), McConnell et al.
patent: 4899768 (1990-02-01), Yatabe
patent: 4911761 (1990-03-01), McConnell et al.
patent: 5315766 (1994-05-01), Roberson, Jr. et al.
patent: 5331987 (1994-07-01), Hayashi et al.
patent: 5370142 (1994-12-01), Nishi et al.
patent: 5520744 (1996-05-01), Fujikawa et al.

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