Substrate washing and drying apparatus, substrate washing method

Details Substrate washing and drying apparatus, substrate washing method Substrate washing and drying apparatus, substrate washing method

1996-12-05

1998-12-08

Stinson, Frankie L.

Cleaning and liquid contact with solids

Apparatus

Automatic controls

134 953, 1341023, 134113, 134186, 134902, B08B 310

Patent

active

058456600

ABSTRACT:
A substrate washing and drying apparatus comprising a processing section for holding wafers, to which process solution to wash and vapor for drying the wafers are introduced, a supply/discharge port for introducing solution to the process section, and discharging the solution from the process section, a solution supply mechanism for selecting one from a plurality of kinds of solution, a drying vapor generation section having a heater for generation vapor for drying, a discharging solution mechanism having an opening for rapidly discharging the solution from the processing section, resistivity detecting means for detecting a resistivity value of the process solution, and a controller for controlling the supply of solution to the process section based on the resistivity value detected by the resistivity detecting means.

REFERENCES:
patent: 4778532 (1988-10-01), McConnell et al.
patent: 4919761 (1990-04-01), Schiel et al.

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