Gas separation – Specific media material – Ceramic or sintered
Reexamination Certificate
2005-12-06
2005-12-06
Smith, Duane (Department: 1724)
Gas separation
Specific media material
Ceramic or sintered
C055S385300, C055SDIG007, C055SDIG030, C060S311000, C264S628000, C264S630000, C264S638000, C264S177120, C264S209300, C264S210100, C264S210300, C264SDIG048
Reexamination Certificate
active
06972045
ABSTRACT:
A method of fabricating a substrate used for purifying an exhaust gas is provided. This method comprises the step of transforming a pre-mold having a first end, a second end, a plurality of partition walls extending between the first end and the second end, the first transforming step for transforming the end portions of the partition walls at the first end in such a manner that the ends of the partition walls defining one of two adjacent passages at the first end of the pre-mold are collected toward the center of a corresponding passage and connected to each other, and the second transforming step for transforming the ends of the partition walls at the first end in such a manner that the end surfaces of the partition walls at the first end are depressed toward the center of each of the end surfaces.
REFERENCES:
patent: 4695301 (1987-09-01), Okajima et al.
patent: 6863705 (2005-03-01), Ishihara et al.
patent: 6898930 (2005-05-01), Nakatani et al.
patent: 2003/0230080 (2003-12-01), Nakatani et al.
patent: 2004/0172929 (2004-09-01), Itoh et al.
patent: 2004/0206062 (2004-10-01), Ichikawa
patent: 2004/0244343 (2004-12-01), Nakatani et al.
patent: 2 841 151 (2003-12-01), None
patent: A 8-508199 (1996-09-01), None
patent: 2004-324575 (2004-11-01), None
patent: WO 94/22556 (1994-10-01), None
patent: WO 03/014545 (2003-02-01), None
U.S. Appl. No. 10/333,414, filed on Jan. 21, 2003, Nakatani.
Greene Jason M.
Oliff & Berridg,e PLC
Smith Duane
Toyota Jidosha & Kabushiki Kaisha
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