Coating apparatus – Projection or spray type – With hood or offtake for waste material
Patent
1997-08-27
1999-08-31
Simmons, David A.
Coating apparatus
Projection or spray type
With hood or offtake for waste material
118300, 118 69, 96244, 96228, 96417, 96234, 96408, 432198, 432201, B05B 128, B01D 4706, B05C 1100, F27B 504
Patent
active
059448946
ABSTRACT:
A substrate treatment system comprises process sections provided with at least either of liquid treatment group units and heat treatment group units, an upper space formed above the process sections in order to supply air to the process sections, a purification section for removing alkaline components from the air to be supplied to the upper spaces to purify the air, temperature/humidity controller communicating with the urification section and the upper spaces to control the temperature and humidity of the air passing through the purification sections, and fans for supplying air to the top spaces from the temperature/humidity controller, lowering the air from the upper spaces into the process sections, and supplying at least some of the air lowering through the process sections to the temperature/humidity controller.
REFERENCES:
Yukio Manabe et al., "The development of Air Purifing Technique by a Nucleation and Condensation Method", Journal of The Society of Powder Technology Japan, vol. 31 No. 6 (1994), pp. 409-415.(With English Abstract).
Akimoto Masami
Kanzawa Keiko
Katano Takayuki
Kitano Junichi
Semba Norio
Padgett Calvin
Simmons David A.
Tokyo Electron Limited
LandOfFree
Substrate treatment system does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Substrate treatment system, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Substrate treatment system will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2425567