Electric resistance heating devices – Heating devices – Radiant heater
Patent
1998-08-05
1999-03-16
Walberg, Teresa
Electric resistance heating devices
Heating devices
Radiant heater
219405, 392416, F26B 330
Patent
active
058840095
ABSTRACT:
A heat-treatment system comprises a first vessel made of a metal, defining a processing chamber and provided in its side wall with an opening through which a wafer to be heat-treated is carried into and the heat-treated wafer is carried out of the first vessel, a second vessel made of a highly heat-resistant nonmetallic material, disposed in the processing chamber and provided in its side wall with an opening coinciding with the opening of the first vessel. A wafer support device is disposed in the processing chamber and has a wafer support table. A heating device for heating a wafer supported on the wafer support table, a process gas supply unit is disposed opposite to a wafer supported on the wafer support table. An enclosing side wall is extended from the periphery of the process gas supply unit so as to surround a processing space between the process gas supply unit and the wafer support table. The process gas supply unit is held on a level where the enclosing side wall covers the openings and define a small processing space around the wafer while the wafer is being subjected to a heat-treatment process. A purge gas is supplied into spaces between the first vessel and the second vessel to prevent the process gases from coming into contact with the first vessel made of a metal to prevent the corrosion of the first vessel.
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Patel Vinod D.
Tokyo Electron Limited
Walberg Teresa
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