Substrate treatment method using soluble particles

Details Substrate treatment method using soluble particles Substrate treatment method using soluble particles

1997-04-28

1998-10-13

Dote, Janis L.

Radiation imagery chemistry: process, composition, or product th

Electric or magnetic imagery, e.g., xerography,...

Process of making radiation-sensitive product

430 69, 430127, 451 38, 451 39, 451 40, 451 49, G03G 510

Patent

active

058210261

ABSTRACT:
There is disclosed a method for surface treating a substrate used in a photosensitive imaging member including: (a) impinging a honing composition comprised of particulate material against the substrate surface to create a surface roughness sufficient to substantially suppress formation of a pattern of light and dark interference fringes upon exposure of the photosensitive imaging member, wherein the particulate material is capable of being dissolved by a solvent; and (b) rinsing the substrate surface having the surface roughness with a cleansing composition comprised of the solvent, wherein any particulate material remaining on the substrate surface having the surface roughness is dissolved by the solvent.

REFERENCES:
patent: 5160547 (1992-11-01), Kirschner et al.
patent: 5166023 (1992-11-01), Harada et al.
patent: 5302485 (1994-04-01), Swain
patent: 5365702 (1994-11-01), Shank, Jr.
patent: 5573445 (1996-11-01), Rasmussen et al.
patent: 5575705 (1996-11-01), Yam et al.

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