Substrate treatment apparatus and substrate treatment method

Details Substrate treatment apparatus and substrate treatment method Substrate treatment apparatus and substrate treatment method

2003-07-31

2009-02-24

Markoff, Alexander (Department: 1792)

Cleaning and liquid contact with solids

Processes

Using sequentially applied treating agents

C134S030000, C134S036000, C134S094100, C134S095300, C134S102200, C134S103200, C134S902000

Reexamination Certificate

active

07494549

ABSTRACT:
A substrate treatment apparatus for removing an unnecessary substance from a surface of a substrate. The apparatus is provided with: an oxidation liquid supply mechanism for supplying an oxidation liquid having an oxidative effect to the substrate surface; a physical cleaning mechanism for physically cleaning the substrate surface; and an etching liquid supply mechanism for supplying an etching liquid having an etching effect to the substrate surface. It is preferred to physically clean the substrate surface while supplying the oxidation liquid to the substrate surface.

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