Substrate treatment apparatus and substrate treatment method

Details Substrate treatment apparatus and substrate treatment method Substrate treatment apparatus and substrate treatment method

2011-07-19

2011-07-19

Carter, Monica S (Department: 3727)

Brushing, scrubbing, and general cleaning

Machines

Brushing

C015S102000, C015S088200

Reexamination Certificate

active

07979942

ABSTRACT:
A substrate treatment apparatus including a substrate holding mechanism for holding a substrate; a first brush made of an elastically deformable material and having a cleaning surface inclined with respect to a perpendicular direction perpendicular to one surface of the substrate held by the substrate holding mechanism; a first brush moving mechanism for moving the first brush with respect to the substrate held by the substrate holding mechanism; a controller for controlling the first brush moving mechanism so that the cleaning surface is made to contact with a peripheral area on the one surface and a peripheral end face of the substrate held by the substrate holding mechanism; and a first pushing pressure holding mechanism for holding a pushing pressure of the first brush in the perpendicular direction to the peripheral area on the one surface of the substrate at a preset pushing pressure.

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Official Action issued Jan. 6, 2011 in connection with corresponding Japanese Patent Application No. 2006-095554 (JP2003-151943 was previously submitted in an IDS filed on Mar. 30, 2007 and is therefore not enclosed.).
Official Action issued Jan. 6, 2011 in connection with corresponding Japanese Patent Application No. 2006-095552 (JP2003-151943 was previously submitted in an IDS filed on Mar. 30, 2007 and is therefore not enclosed.).

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