Cleaning and liquid contact with solids – Apparatus – Sequential work treating receptacles or stations with means...
Reexamination Certificate
2008-03-06
2011-10-11
Stinson, Frankie L (Department: 1711)
Cleaning and liquid contact with solids
Apparatus
Sequential work treating receptacles or stations with means...
C134S078000, C134S157000, C134S902000, C414S222010
Reexamination Certificate
active
08033288
ABSTRACT:
A substrate treatment apparatus includes a container holder which holds a container for containing multiple substrates vertically stacked in horizontal postures, a substrate treatment section which collectively applies treatment to multiple substrates horizontally stacked in vertical postures, a main conveyance mechanism which conveys multiple substrates horizontally stacked in vertical postures between a substrate delivery position and the substrate treatment section, a carrying in/out mechanism which carries in/out the multiple substrates with respect to the container and changes postures of the multiple substrates between the horizontal postures and the vertical postures, and a sub conveyance mechanism which receives and delivers multiple substrates in vertical postures from and to the carrying in/out mechanism at a transfer position, receives and delivers multiple substrates in vertical postures from and to the main conveyance mechanism at the substrate delivery position, and conveys multiple substrates in vertical postures between the transfer and substrate delivery positions.
REFERENCES:
patent: 4987407 (1991-01-01), Lee
patent: 6009890 (2000-01-01), Kaneko et al.
patent: 6158449 (2000-12-01), Kamikawa
patent: 6164297 (2000-12-01), Kamikawa
patent: 6375758 (2002-04-01), Nakashima et al.
patent: 6575178 (2003-06-01), Kamikawa
patent: 7108752 (2006-09-01), Kuroda
patent: 2001/0049204 (2001-12-01), Kuroda
patent: 2002/0037207 (2002-03-01), Yamasaki et al.
patent: 2003/0164179 (2003-09-01), Kamikawa et al.
patent: 2004/0187342 (2004-09-01), Izuta
patent: 2006/0137721 (2006-06-01), Kuroda
patent: 2006/0137726 (2006-06-01), Sano et al.
patent: 2009/0010748 (2009-01-01), Kamikawa et al.
patent: 11-163089 (1999-06-01), None
patent: 11-165863 (1999-06-01), None
patent: 11-354604 (1999-12-01), None
patent: 3248129 (2001-11-01), None
patent: 2002-64075 (2002-02-01), None
patent: 2002-76094 (2002-03-01), None
patent: 2006-179757 (2006-07-01), None
patent: 2007-123592 (2007-05-01), None
patent: 10-2003-0080355 (2003-10-01), None
patent: 10-2004-0008331 (2004-01-01), None
Korean Office Action (Decision to Grant) issued Aug. 3, 2010 in connection with corresponding Korean Patent Application No. 10-2008-0018770.
Muramoto Ryo
Nishina Yoshihiro
Sato Toru
Shiomi Akio
Dainippon Screen Mfg. Co,. Ltd.
Ostrolenk Faber LLP
Stinson Frankie L
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