Cleaning and liquid contact with solids – Processes – For metallic – siliceous – or calcareous basework – including...
Reexamination Certificate
2006-03-28
2006-03-28
Le, Hoa Van (Department: 1752)
Cleaning and liquid contact with solids
Processes
For metallic, siliceous, or calcareous basework, including...
C430S311000, C430S325000, C396S579000, C396S604000, C396S605000, C396S609000, C396S611000, C396S625000, C396S627000, C134S015000, C134S016000, C134S026000, C134S030000, C134S032000, C134S033000, C134S034000, C134S036000, C134S037000
Reexamination Certificate
active
07018481
ABSTRACT:
There is disclosed a substrate treating method comprising supplying a treating solution onto a substrate, and continuously discharging a first cleaning solution to the substrate from a first discharge region disposed in a nozzle, while moving the nozzle and substrate with respect to each other in one direction, wherein a length of a direction crossing at right angles to the direction of the first discharge region is equal to or more than a maximum diameter or longest side of the substrate, the nozzle continuously spouts a first gas to the substrate from a first jet region, and the length of a direction crossing at right angles to the direction of the first jet region is equal to or more than the maximum diameter or longest side of the substrate.
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Ema Tatsuhiko
Hayasaki Kei
Ito Shin'ichi
Takahashi Riichiro
Finnegan Henderson Farabow Garrett & Dunner L.L.P.
Kabushiki Kaisha Toshiba
Le Hoa Van
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