Substrate treating method and apparatus

Details Substrate treating method and apparatus Substrate treating method and apparatus

2005-09-13

2005-09-13

Ghyka, Alexander (Department: 2812)

Cleaning and liquid contact with solids

Apparatus

Sequential work treating receptacles or stations with means...

C134S105000, C134S902000, C438S745000

Reexamination Certificate

active

06941956

ABSTRACT:
A substrate treating method for treating substrates with a treating solution includes a step of heating a treating solution containing sulfuric acid, and treating, with the treating solution, the substrates coated with a film material including a high dielectric-constant material. The substrates with the high dielectric-constant material are treated appropriately by heating, before use, the treating solution containing sulfuric acid.

REFERENCES:
patent: 3869313 (1975-03-01), Jones et al.
patent: 5288333 (1994-02-01), Tanaka et al.
patent: 6253775 (2001-07-01), Kitahara et al.
patent: 6344403 (2002-02-01), Madhukar et al.
patent: 6383723 (2002-05-01), Iyer et al.

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