Cleaning and liquid contact with solids – Apparatus – Sequential work treating receptacles or stations with means...
Patent
1996-12-04
2000-02-08
Stinson, Frankie L.
Cleaning and liquid contact with solids
Apparatus
Sequential work treating receptacles or stations with means...
134 66, 134 64R, 134122R, 198373, B08B 302
Patent
active
060217901
ABSTRACT:
A substrate treating apparatus for successively treating substrates includes a body having a carrying unit for carrying the substrate along a carrying surface. The carrying surface is inclined in a plane perpendicular to the carrying direction of the substrate. The body supplies a treating liquid to the substrate being carried for treating the substrate. A receiving station is disposed upstream of the body for changing the posture of the substrate from a horizontal posture to an inclined posture corresponding to the inclination of the carrying surface, and for forwarding the substrate onto the carrying unit. In addition, a delivering station is disposed downstream of the body for returning the substrate forwarded from the carrying unit in the inclined posture to the horizontal posture.
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Matsushita Yoshihiko
Mori Makoto
Tanaka Iwao
Wada Eiichi
Yoshitani Mitsuaki
Dainippon Screen Mfg. Co.,Ltd.
Stinson Frankie L.
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