Substrate treating apparatus

Details Substrate treating apparatus Substrate treating apparatus

2005-05-17

2005-05-17

Mathews, Alan (Department: 2851)

Photography

Fluid-treating apparatus

Fluid application to one side only of photographic medium

C414S225010, C414S935000, C355S027000

Reexamination Certificate

active

06893171

ABSTRACT:
A substrate treating apparatus disclosed herein realizes improved throughput. The substrate treating apparatus according to this invention includes an antireflection film forming block, a resist film forming block and a developing block arranged in juxtaposition. Each block includes chemical treating modules, heat-treating modules and a single main transport mechanism. The main transport mechanism transports substrates within each block. Transfer of the substrates between adjacent blocks is carried out through substrate rests. The main transport mechanism of each block is not affected by movement of the main transport mechanisms of the adjoining blocks. Consequently, the substrates may be transported efficiently to improve the throughput of the substrate treating apparatus.

REFERENCES:
patent: 5651823 (1997-07-01), Parodi et al.
patent: 6515731 (2003-02-01), Akimoto
patent: 04-305914 (1992-10-01), None
patent: 07-171478 (1995-07-01), None
Translation of Japanese Patent 07-171478.

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