Substrate treating apparatus

Details Substrate treating apparatus Substrate treating apparatus

2005-01-04

2005-01-04

Mathews, Alan (Department: 2851)

Photography

Fluid-treating apparatus

Fluid application to one side only of photographic medium

C414S935000, C118S500000

Reexamination Certificate

active

06837632

ABSTRACT:
A substrate treating apparatus has an antireflection film forming block, a resist film forming block and a developing block arranged in juxtaposition, each of these blocks including treating modules and a single main transport mechanism. The main transport mechanism transports substrates within each block, and transfers the substrates between the blocks through inlet substrate rests and outlet substrate rests provided as separate components. This construction realizes improved throughput of the substrate treating apparatus.

REFERENCES:
patent: 5651823 (1997-07-01), Parodi et al.
patent: 6515731 (2003-02-01), Akimoto
patent: 7-171478 (1995-07-01), None

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