Substrate treating apparatus

Details Substrate treating apparatus Substrate treating apparatus

2007-11-30

2009-06-23

Mathews, Alan A (Department: 2851)

Photography

Fluid-treating apparatus

Fluid application to one side only of photographic medium

C396S571000, C118S052000, C118S320000, C355S027000, C414S935000

Reexamination Certificate

active

07549811

ABSTRACT:
A forward direction-only path (first substrate transport path) is formed for transporting substrates in a forward direction to pass the substrates on to an exposing apparatus. A separate, substrate transport path (second substrate transport path) is formed exclusively for post-exposure bake (PEB). Substrate transport along each path is carried out independently of substrate transport along the other. A fourth main transport mechanism is interposed as a predetermined substrate transport mechanism between transfer points consisting of a buffer acting as a temporary storage module for temporarily storing the substrates and a post-exposure bake (PEB) unit corresponding to a predetermined treating unit. This arrangement forms the path for transporting the substrates between the buffer and the PEB unit, to allow PEB treatment of the substrates to be performed smoothly. Similarly, the substrates are transported smoothly to the buffer.

REFERENCES:
patent: 5935768 (1999-08-01), Biche et al.
patent: 6402401 (2002-06-01), Ueda et al.
patent: 6893171 (2005-05-01), Fukutomi et al.
patent: 2003/0091410 (2003-05-01), Larson et al.
patent: 1455438 (2003-11-01), None
patent: 6-151293 (1994-05-01), None
patent: 8-17724 (1996-01-01), None
Office Action dated Nov. 17, 2006 for corresponding Chinese Patent Application No. 2004-101032576.

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