Cleaning and liquid contact with solids – Apparatus – Sequential work treating receptacles or stations with means...
Reexamination Certificate
2007-09-11
2007-09-11
Kornakov, Michael (Department: 1746)
Cleaning and liquid contact with solids
Apparatus
Sequential work treating receptacles or stations with means...
C134S062000, C134S063000, C134S066000, C134S069000, C134S078000, C134S080000, C134S084000, C134S085000, C134S086000, C134S089000
Reexamination Certificate
active
10681450
ABSTRACT:
A substrate treating apparatus for treating substrates includes a treating tank for receiving and treating the substrates, a holding device movable, while holding the substrates in a cantilever mode, between a treating position in the treating tank and a transfer position above the treating tank, a transport device for supporting the substrates and transferring the substrates to and from the holding device in the transfer position, a detecting device for detecting a posture variation of the holding device, and a correcting device for correcting a position of the holding device or the transport device. The correcting device performs a correction according to the posture variation of the holding device detected by the detecting device in time of transfer of the substrates between the holding device and the transport device.
REFERENCES:
patent: 6198201 (2001-03-01), Okumura
patent: 6259960 (2001-07-01), Inokuchi
patent: 08-340035 (1996-12-01), None
patent: 11-289000 (1999-10-01), None
Hasegawa Koji
Hiroe Toshio
Mitsuyoshi Ichiro
Nishina Yoshihiro
Dainippon Screen Mfg. Co,. Ltd.
Kornakov Michael
Ostrolenk Faber Gerb & Soffen, LLP
Patel Rita R
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