Substrate treating apparatus

Details Substrate treating apparatus Substrate treating apparatus

1997-06-16

1999-03-02

Coe, Philip R.

Cleaning and liquid contact with solids

Apparatus

With non-impelling fluid deflector or baffle other than...

134902, B08B 304

Patent

active

058758046

ABSTRACT:
A substrate treating apparatus adapted for treating a substrate with treating fluid therein, the substrate treating apparatus includes a processing bath; a baffle plate with a plurality of holes disposed therein for dividing the processing bath into an upper region and a lower region, the holes allowing communication of the treating liquid between the upper region and the lower region. The baffle plate is composed of a material exhibiting a property that the contact angle of a bubble generated in the treating liquid with respect to the baffle plate is smaller than a predetermined value.

REFERENCES:
patent: 4735220 (1988-04-01), Chandler
patent: 5226437 (1993-07-01), Kamikawa et al.
patent: 5503171 (1996-04-01), Yokomizo et al.
patent: 5540247 (1996-07-01), Kawatani et al.

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