Coating apparatus – Projection or spray type – Rotating work
Patent
1998-08-10
2000-12-12
Beck, Shrive
Coating apparatus
Projection or spray type
Rotating work
118 52, 118320, 118323, 427240, B05B 1302
Patent
active
061592919
ABSTRACT:
A substrate treating apparatus for treating a substrate in a predetermined substrate treating region. Each holder arm is supported in a proximal end portion thereof by an arm support to be swingable about a pivotal axis. In time of substrate treatment, the arm support is raised by an air cylinder. With the ascent of the arm support, a cam follower attached to a proximal end of the holder arm is guided by a cam groove. The holder arm, while being raised, turns from a vertical standby posture to a horizontal posture for treating the substrate. As a result, a treating device attached to a distal end of the holder arm moves to a treating position. In the treating position, the treating device treats the substrate. The holder arms are maintained in the vertical standby posture when out of use in substrate treatment. Thus, the holder arms require a reduced standby space.
REFERENCES:
patent: 4132938 (1979-01-01), Sano et al.
patent: 4987851 (1991-01-01), Yasuda et al.
patent: 5016567 (1991-05-01), Iwabuchi et al.
patent: 5089305 (1992-02-01), Ushijima et al.
patent: 5324547 (1994-06-01), Ohhashi et al.
patent: 5514215 (1996-05-01), Takamatsu et al.
patent: 5685039 (1997-11-01), Hamada et al.
patent: 5772764 (1998-06-01), Akimoto
patent: 5853812 (1998-12-01), Kawasaki et al.
patent: 5863328 (1999-01-01), Sichmann et al.
Morita Akihiko
Nishimura Joichi
Ohtani Masami
Beck Shrive
Calcagni Jennifer
Dainippon Screen Mfg. Co,. Ltd.
LandOfFree
Substrate treating apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Substrate treating apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Substrate treating apparatus will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-212447